SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Experimental evaluation of out-of-plane distortion of electrostatically chucked EUV reticle
Ota, Kazuya, Schellenberg, Frank M., Taguchi, Takao, Amemiya, Mitsuaki, Nishiyama, Yasushi, Kamono, Takashi, Nishimura, Naosuke, Takikawa, Tadahiko, Usui, Youichi, Suga, OsamuVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.771339
File:
PDF, 711 KB
english, 2008