SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Enabling 35nm double patterning contact imaging using a novel CD shrink process
Yamada, Yoshiaki, Crouse, Michael M., Dunn, Shannon, Kawasaki, Tetsu, Shimura, Satoru, Nishimura, Eiichi, Tanaka, Yoshitsugu, Galloway, Judy, Pierson, Bill, Routh, RobertVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.774988
File:
PDF, 801 KB
english, 2008