SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Novel approach for immersion lithography defectivity control to increase productivity
Englard, Ilan, Allgair, John A., Raymond, Christopher J., Stegen, Raf, Vanoppen, Peter, Minnaert-Janssen, Ingrid, der Kinderen, Ted, van Brederode, Erik, Duray, Frank, Linders, Jeroen, Ovchinnikov, DeVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.776085
File:
PDF, 701 KB
english, 2008