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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - In-die registration metrology on future-generation reticles
Roeth, Klaus-Dieter, Allgair, John A., Raymond, Christopher J., Laske, Frank, Kinoshita, Hiroshi, Kenmochi, Daisuke, Schmidt, Karl-Heinrich, Adam, DieterVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813944
File:
PDF, 936 KB
english, 2009