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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - High-precision CD matching monitoring technology using profile gradient method for the 32-nm technology generation
Ikegami, Toru, Allgair, John A., Raymond, Christopher J., Kono, Akemi, Maeda, Tatsuya, Osaki, Mayuka, Shishido, ChieVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813968
File:
PDF, 432 KB
english, 2009