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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Contact mask optimization and SRAF design
Schroeder, Uwe P., Levinson, Harry J., Dusa, Mircea V., Tabery, Cyrus, Morgenfeld, Bradley, Kanai, HidekiVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814814
File:
PDF, 436 KB
english, 2009