SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method
Shigemura, Hiroyuki, Hosono, Kunihiro, Amano, Tsuyoshi, Nishiyama, Yasushi, Suga, Osamu, Arisawa, Yukiyasu, Hashimoto, Hideaki, Takahara, Kenichi, Usuda, Kinya, Kikuiri, Nobutaka, Hirano, RyoichiVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824334
File:
PDF, 717 KB
english, 2009