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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Reduction of local CD-linewidth variations in resist develop through acoustic streaming
Lee, Gaston, Zurbrick, Larry S., Montgomery, M. Warren, Dress, Peter, Chen, Ssuwei, Dietze, UweVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829613
File:
PDF, 267 KB
english, 2009