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SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Hot spot management through design based metrology: measurement and filtering
Lee, Taehyeong, Chen, Alek C., Han, Woo-Sung, Yang, Hyunjo, Kim, Jungchan, Lin, Burn J., Yen, Anthony, Jung, Areum, Yoo, Gyun, Yim, Donggyu, Park, Sungki, Ishikawa, Akio, Yamamoto, Masahiro, Vikram, AVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837228
File:
PDF, 2.38 MB
english, 2009