SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system
Yamada, Akio, Herr, Daniel J. C., Oae, Yoshihisa, Okawa, Tatsuro, Takizawa, Masahiro, Yamabe, MasakiVolume:
7637
Year:
2010
Language:
english
DOI:
10.1117/12.846464
File:
PDF, 3.48 MB
english, 2010