SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A full chip MB-SRAF placement using the SRAF guidance map

Tsai, Min-Chun, Montgomery, M. Warren, Maurer, Wilhelm, Nojima, Shigeki, Miyairi, Masahiro, Nishibe, Tatsuo, Chen, Been-Der, Feng, Hanying, Wong, William, Zhu, Zhangnan, Lu, Yen-Wen
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Volume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.866139
File:
PDF, 411 KB
english, 2010
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