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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Challenges in flare correction in EUVL lithography for half pitch 22-nm generation
Uno, Taiga, Hosono, Kunihiro, Arisawa, Yukiyasu, Aoyama, Hajime, Tanaka, ToshihikoVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.867911
File:
PDF, 1.33 MB
english, 2010