SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source
Yanagida, Tatsuya, La Fontaine, Bruno M., Naulleau, Patrick P., Nagano, Hitoshi, Wada, Yasunori, Yabu, Takayuki, Nagai, Shinji, Soumagne, Georg, Hori, Tsukasa, Kakizaki, Kouji, Sumitani, Akira, FujimoVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.879189
File:
PDF, 1.80 MB
english, 2011