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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Novel surface imaging process with ion-beam lithography and dry development
Jagdhold, Ulrich A., Pilz, Wolfgang, Buchmann, L. M., Torkler, M., Peckerar, Martin C.Volume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136035
File:
PDF, 464 KB
english, 1992