SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Process window analysis of the ARC and TAR systems for quarter-micron optical lithography
Yoshino, Hiroshi, Ohfuji, Takeshi, Aizaki, Naoaki, Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175341
File:
PDF, 420 KB
english, 1994