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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Combination of transmission and absorption mask for 0.3-um lithography
Bauch, Lothar, Bauer, Joachim J., Boettcher, Monika, Jagdhold, Ulrich A., Haak, Ulrich, Spiess, Walter, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175409
File:
PDF, 953 KB
english, 1994