![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Total evaluation of W-Ti absorber for x-ray mask
Marumoto, Kenji, Yabe, Hideki, Aya, Sunao, Kise, Koji, Matsui, Yasuji, Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175808
File:
PDF, 931 KB
english, 1994