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SPIE Proceedings [SPIE International Conference on Optical Instruments and Technology (OIT2013) - Beijing, China (Sunday 17 November 2013)] 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments - Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography
Wang, Yongtian, Yuan, Xiaocong, Sheng, Yunlong, Tatsuno, Kimio, Chun, Ouyang, Li, Yanqiu, Liu, LihuiVolume:
9042
Year:
2013
Language:
english
DOI:
10.1117/12.2053896
File:
PDF, 807 KB
english, 2013