SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Nonlinear imaging effects using high-contrast resists
Hurditch, Rodney J., Hansen, Steven G., Ferri, John E., Brzozowy, David J., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210389
File:
PDF, 817 KB
english, 1995