SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Applications of enhanced optical proximity correction models
Zhao, Jack Q., Garofalo, Joseph G., Blatchford, James W., Ehrlacher, Edward, Nease, Ellis, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310753
File:
PDF, 2.01 MB
english, 1998