SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Optimizing a DUV positive resist for metal layers
Malik, Sanjay, Maxwell, Brian, Gandolfi, Anna, Ornaghi, Alberto, Whewell, Allyn, Uhnak, Kenneth, Volpi, Stefano, Van Driessche, Veerle, Sarubbi, Thomas R., Hansen, Steven G., Bowden, Murrae J., ConleyVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350235
File:
PDF, 1.16 MB
english, 1999