SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi, Pushkara R., Jordhamo, George M., Lawson, Margaret C., Chen, K. Rex, Brunsvold, William R., Hughes, Timothy, Keller, Robin, Khojasteh, Mahmoud, Li, W., Allen, Robert D., Ito, Hiroshi, Opitz,Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388280
File:
PDF, 1.10 MB
english, 2000