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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Layer-to-layer alignment for step and flash imprint lithography
Choi, Byung J., Meissl, Mario J., Colburn, Matthew, Bailey, Todd C., Ruchhoeft, Paul, Sreenivasan, S. V., Prins, F., Banerjee, Sanjay K., Ekerdt, John G., Willson, C. Grant, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436662
File:
PDF, 433 KB
english, 2001