SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Transparent resins for 157-nm lithography
Dammel, Ralph R., Sakamuri, Raj, Romano, Andrew R., Vicari, Richard, Hacker, Cheryl, Conley, Will, Miller, Daniel A., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436865
File:
PDF, 894 KB
english, 2001