SPIE Proceedings [SPIE Photomask and Next Generation...

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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Advantages of using the CAR for photomask manufacturing

Kondoh, Takehiro, Itoh, Masamitsu, Taniguchi, Rikiya, Ohtsubo, Kyoh, Sakai, Mari, Watanabe, Hidehiro, Kawahira, Hiroichi
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Volume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438349
File:
PDF, 300 KB
english, 2001
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