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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography
Shiraishi, Masayuki, Ishiyama, Wakana, Kandaka, Noriaki, Oshino, Tetsuya, Murakami, Katsuhiko, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472329
File:
PDF, 744 KB
english, 2002