![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Comparative investigation of CD-SEM carryover effect
Chernakova, Anna K., Miller, Brad, Boonstra, Thomas R., Fan, Alan J., Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473423
File:
PDF, 107 KB
english, 2002