SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Atomic force microscopy of steep side-walled feature with carbon nanotube tip
Park, Byong Chon, Herr, Daniel J., Kang, Jae-Hyun, Jung, Ki Y., Song, Won Young, O, Beomhoan, Eom, TaeBongVolume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.482816
File:
PDF, 525 KB
english, 2003