SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Phase defect printability analysis for chromeless phase lithography technology
Huh, Sungmin, Tanabe, Hiroyoshi, Park, JoHyung, Chung, Dong-Hoon, Kim, Chang-Hwan, Shin, In-Kyun, Choi, Sung-Woon, Sohn, Jung-MinVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504395
File:
PDF, 685 KB
english, 2003