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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - OPC model calibration for CPL patterning at extreme low k 1
Shi, Xuelong, Staud, Wolfgang, Weed, J. Tracy, Laidig, Tom, Chen, J. Fung, Van Den Broeke, Douglas, Hsu, Stephen, Hsu, Michael, Wampler, Kurt E., Hollerbach, Uwe, Park, Jung Chul, Yu, LindaVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569655
File:
PDF, 315 KB
english, 2004