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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology
Hsu, Michael, Smith, Bruce W., Van Den Broeke, Doug, Laidig, Tom, Wampler, Kurt E., Hollerbach, Uwe, Socha, Robert, Chen, J. F., Hsu, Stephen, Shi, XuelongVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.598589
File:
PDF, 1.71 MB
english, 2005