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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Critical dimension uniformity control with combined ellipsometry and reflectometry
Opsal, Jon, Silver, Richard M., Leng, Jingmin, Cao, XuelongVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.600124
File:
PDF, 433 KB
english, 2005