SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Quantification of two-dimensional structures generalized for OPC model verification
Shi, Xuelong, Archie, Chas N., Chen, J. Fung, Van Den Broeke, Doug, Hsu, Stephen, Hsu, MichaelVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.713867
File:
PDF, 382 KB
english, 2007