SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Production aspects of 45nm immersion lithography defect monitoring using laser DUV inspection methodology
Kirsch, Remo, Allgair, John A., Raymond, Christopher J., Martin, Antje, Okoroanyanwu, Uzodinma, Grundke, Wolfram, Vogler, Ute, Beyer, Mirko, Valfer, Eran, Weiher-Tellford, Susan, Perlovitch, Renana, RVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.777371
File:
PDF, 1.79 MB
english, 2008