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SPIE Proceedings [SPIE 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Chengdu, China (Sunday 8 July 2007)] 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Rapid nanofabrication with high density pattern with UVN30 chemically amplified resist
Wang, Xudi, Chen, Yifang, Cui, Zheng, Fu, Shaojun, Han, Sen, Xing, Tingwen, Li, Yanqiu, Cui, ZhengVolume:
6724
Year:
2007
Language:
english
DOI:
10.1117/12.782497
File:
PDF, 1.54 MB
english, 2007