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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - MoSi absorber photomask for 32nm node
Konishi, Toshio, Horiuchi, Toshiyuki, Kojima, Yosuke, Takahashi, Hiroyuki, Tanabe, Masato, Haraguchi, Takashi, Lamantia, Matthew, Fukushima, Yuichi, Okuda, YoshimitsuVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.796010
File:
PDF, 2.22 MB
english, 2008