SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - An efficient method for transfer cross coefficient approximation in model based optical proximity correction
Sabatier, Romuald, Kawahira, Hiroichi, Zurbrick, Larry S., Fossati, Caroline, Bourennane, Salah, Di Giacomo, AntonioVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801623
File:
PDF, 215 KB
english, 2008