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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Requirements of the inspection for double patterning technology reticles
Cho, Wonil, Allgair, John A., Raymond, Christopher J., Kim, Won-Sun, Sohn, Sung-Joon, Lee, Sunpyo, Choi, Jihyeon, Kim, Yonghoon, Cho, HanKuVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.814101
File:
PDF, 364 KB
english, 2009