SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Development and evaluation of new MRC parameter for aggressive mask optimization
Shim, Seong-bo, Chen, Alek C., Han, Woo-Sung, Kim, Young-chang, Jang, Seong-hoon, Lin, Burn J., Yen, Anthony, Kim, Hee-bom, Lee, Sung-woo, Choi, Seong-woon, Cho, Han-ku, Park, Chan-hoonVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.839398
File:
PDF, 413 KB
english, 2009