SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - Elimination of lithographic hotspots which have been waived by means of pattern matching
Chaudhary, Aditya, Konishi, Toshio, Bouchard, Pierre, Dave, Kalpesh, Desouky, Tamer, Moamen, Karim, Simmons, MarkVolume:
8081
Year:
2011
Language:
english
DOI:
10.1117/12.897527
File:
PDF, 808 KB
english, 2011