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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Effect of partial deprotection on lithographic properties of t-butoxycarbonyloxystyrene-containing polymers
Mixon, David A., Nalamasu, Omkaram, Bohrer, M. P., Alonzo, J. C.Volume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175346
File:
PDF, 428 KB
english, 1994