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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Improved reflectivity control of APEX-E positive tone deep-UV photoresist
Conley, Will, Nalamasu, Omkaram, Akkapeddi, Ravindra, Fahey, James T., Hefferon, George J., Holmes, Steven J., Spinillo, Gary T., Sturtevant, John L., Welsh, Kevin M.Volume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175360
File:
PDF, 856 KB
english, 1994