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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology
Katz, Barton A., Rogoff, Richard, Foster, James, Rericha, William T., Rolfson, J. Brett, Holscher, Richard D., Sager, Craig B., Reynolds, Patrick, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175437
File:
PDF, 544 KB
english, 1994