SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Characterization of a 'first measurement effect' in CD-SEM measurement
Cai, Boxiu, Lin, Yi-Shih, Wu, Qiang, Huang, Yi, Yang, Siyuan, Li, Wen-Hui, Hao, Michael, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2010942
File:
PDF, 396 KB
english, 2013