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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Simulation study of CD variation caused by field edge effects and out-of-band radiation in EUVL
Gao, Weimin, Niroomand, Ardavan, Lorusso, Gian F., Boone, Robert, Lucas, Kevin, Demmerle, Wolfgang, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2027880
File:
PDF, 4.30 MB
english, 2013