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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
Cain, Jason P., Sanchez, Martha I., Seguin, Benoit, Saab, Henri, Gabrani, Maria, Estellers, VirginiaVolume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2045463
File:
PDF, 518 KB
english, 2014