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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Characterization of chemically amplified resists for electron beam lithography
Wallow, Thomas I., Hohle, Christoph K., Yamazaki, Tomoharu, Yamamoto, Hiroki, Kozawa, Takahiro, Wang, Wen-ChuanVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046240
File:
PDF, 1.25 MB
english, 2014