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SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX (Wednesday 25 October 1995)] Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II - Surface photovoltage analysis of iron contamination in silicon processing and the relation to gate oxide integrity
Henley, Worth B., Lowell, John K., Chen, Ray T., Mathur, Jagdish P.Volume:
2638
Year:
1995
Language:
english
DOI:
10.1117/12.221194
File:
PDF, 464 KB
english, 1995