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SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX (Wednesday 25 October 1995)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing - Effect of sputtering target crystallographic orientation on step coverage and collimation efficiency
Bailey, Robert S., Hill, Nicholas C., Sabnis, Anant G., Raaijmakers, Ivo J.Volume:
2637
Year:
1995
Language:
english
DOI:
10.1117/12.221318
File:
PDF, 448 KB
english, 1995