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SPIE Proceedings [SPIE Micromachining and Microfabrication - Austin, TX (Monday 23 October 1995)] Microlithography and Metrology in Micromachining - Process optimization of single-coat positive photoresist for thick film applications
Kozlowski, Alan E., Postek, Michael T.Volume:
2640
Year:
1995
Language:
english
DOI:
10.1117/12.222639
File:
PDF, 574 KB
english, 1995